Plasma Etching: Fundamentals and Applications
M. Sugawara
1998年5月 · Series on Semiconductor Science and Technology 第 7 本图书 · OUP Oxford
star
1 条评价
电子书
356
页
关于此电子书
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
探索更多
评分和评价
1 条评价
作者简介
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
为此电子书评分
欢迎向我们提供反馈意见。
如何阅读
智能手机和平板电脑
笔记本电脑和台式机
您可以使用计算机的网络浏览器聆听您在 Google Play 购买的有声读物。
电子阅读器和其他设备
如果要在 Kobo 电子阅读器等电子墨水屏设备上阅读，您需要下载一个文件，并将其传输到相应设备上。若要将文件传输到受支持的电子阅读器上，请按帮助中心内的详细说明操作。
